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Facilities
Pulsed laser deposition facility

Real Time Monitoring via RHEED
Control over number of atomic layers

Pulsed Laser Deposition (PLD)
Epitaxial growth of thin films
Trion New200 Dilution refrigerator

Superconductor to insulator transition in an oxide interface
Gate Tunable

Dilution
Base Temp = 8mk
Vector Magnet (9T, 1T, 1T)
Versatile cryogenic station


Atomic Force Microscope, Ion Milling, Furnace up to 1500 Degrees, Wire bonder, fume hood, The center for nanosciences and nanotechnologies – Clean room facilities, e-beam lithography, material characterization facilities.

Temperature range = 0.3-400K
Magnetic Field = 14T
μMLA - micro Maskless Aligner

attocube MFM


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