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Facilities
Pulsed laser deposition facility
Real Time Monitoring via RHEED
Control over number of atomic layers
Pulsed Laser Deposition (PLD)
Epitaxial growth of thin films
Trion New200 Dilution refrigerator
Superconductor to insulator transition in an oxide interface
Gate Tunable
Dilution
Base Temp = 8mk
Vector Magnet (9T, 1T, 1T)
Versatile cryogenic station
Atomic Force Microscope, Ion Milling, Furnace up to 1500 Degrees, Wire bonder, fume hood, The center for nanosciences and nanotechnologies – Clean room facilities, e-beam lithography, material characterization facilities.
Temperature range = 0.3-400K
Magnetic Field = 14T
μMLA - micro Maskless Aligner
attocube MFM
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